Residency Faculty (available for studio mentoring)
Scholar, artist, and curator, Best is the Richard L. Menschel Curator of Photography at the Harvard Art Museums. Previously, Best has been faculty at the California College of Art and the University of Vermont, and an assistant curator at SF MoMA.
She is co-editor and contributor to Conflict, Identity and Protest in American Art, which explores the powerful relationship between artistic product and cultures of conflict in the United States. Best earned an MFA at Cal Arts, and an MA and PhD at Harvard University.